The new method makes it possible to quickly make metal films. They are used in dozens of devices

The researchers noted that many metals and their compounds need to be turned into thin films, which are often

used in technological products -electronics, displays, fuel cells or catalysts. However, some metals are more difficult to turn into films - platinum, iridium, ruthenium, tungsten. First of all, this happens because their evaporation requires a very high temperature - usually more than 2 thousand degrees Celsius.

As a rule, scientists synthesize films of thesemetals using methods such as sputtering and electron beam evaporation. The latter method consists in melting and evaporating metals at high temperatures, after which a film forms on the plates. However, traditional methods are very expensive, consume a lot of energy, and can be unsafe due to high voltages.

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Now researchers at the University of Minnesotadeveloped a method for evaporating these metals at significantly lower temperatures - less than 200 degrees Celsius. By developing and adding organic ligands to metals - combinations of carbon, hydrogen and oxygen atoms - the researchers were able to significantly increase the vapor pressure in the materials, making them easier to vaporize at lower temperatures. Their new methodology is not only simpler, but also allows for higher quality materials that are easily scaled.

These metals are used to producea variety of products, from semiconductors for computer applications to display technology. Platinum, for example, is also an excellent catalyst for energy conversion and storage and is being considered for use in many devices.

“Cost reduction will play a big role asboth in industry and in scientific research, says William Nunn, a graduate student in chemical engineering and materials science at the University of Minnesota. "We now hope to see renewed interest in more complex materials that contain these refractory metals."

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